“锰铜”造句
采用磁控溅射法制备
锰铜薄膜,溅射和真空蒸发法制备镱薄膜.
Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.
用磁控溅射低温沉积镀膜技术制做
锰铜薄膜,能够保持薄膜中锰、铜、镍成份的相对稳定和
锰铜合金正六面三元固溶体金相结构的特性.
Magnetically controlled cathod plasma sputtering technique was used to manufacture the plating manganin film.